Reduction of Reactive-Ion Etching-Induced Ge Surface Roughness by SF6/CF4 Cyclic Etching for Ge Fin Fabrication

Author： Xue-Zhi Ma   Rui Zhang   Jia-Bao Sun   Yi Shi   Yi Zhao  

Publisher： IOP Publishing

E-ISSN： 1741-3540|32|4|45202-45205

ISSN： 0256-307X

Source： Chinese Physics Letters, Vol.32, Iss.4, 2015-04, pp. : 45202-45205

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