A self-aligned gate GaN MOSFET using an ICP-assisted low-temperature Ohmic process

Author: WangQingpeng   JiangYing   ZhangJiaqi   KawaharadaKazuya   LiLiuan   WangDejun   AoJin-Ping  

Publisher: IOP Publishing

E-ISSN: 1361-6641|30|7|75003-75007

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.30, Iss.7, 2015-07, pp. : 75003-75007

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Abstract