A new analytical technique for extraction of bias‐dependent drain resistance in GaAs and GaN HEMTs

Publisher: John Wiley & Sons Inc

E-ISSN: 1098-2760|57|11|2536-2539

ISSN: 0895-2477

Source: MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, Vol.57, Iss.11, 2015-11, pp. : 2536-2539

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract