Numerical Analysis of Substrate‐Incident Carbon Flux in Low‐Pressure Radio‐Frequency CH4 Plasmas for Deposition of Diamond‐Like Carbon Films

Publisher： John Wiley & Sons Inc

E-ISSN： 1520-6440|98|9|31-39

ISSN： 1942-9533

Source： ELECTRONICS & COMMUNICATIONS IN JAPAN, Vol.98, Iss.9, 2015-09, pp. : 31-39

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