MOCVD of TiO2 thin films from a modified titanium alkoxide precursor

Publisher: John Wiley & Sons Inc

E-ISSN: 1862-6319|212|7|1563-1570

ISSN: 1862-6300

Source: PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol.212, Iss.7, 2015-07, pp. : 1563-1570

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract