Gaseous ternary chromium‐aluminium complexes as precursor for chemical vapour deposition

Publisher: John Wiley & Sons Inc

E-ISSN: 1610-1642|12|7|1043-1046

ISSN: 1862-6351

Source: PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.7, 2015-07, pp. : 1043-1046

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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Abstract