High‐resolution characterization of the forbidden Si 200 and Si 222 reflections

Publisher： John Wiley & Sons Inc

E-ISSN： 1600-5767|48|2|528-532

ISSN： 0021-8898

Source： JOURNAL OF APPLIED CRYSTALLOGRAPHY (ELECTRONIC), Vol.48, Iss.2, 2015-04, pp. : 528-532

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