Effect of oxidizing environments on the diffusion-segregation boron distribution in the thermal silicon dioxide-silicon system

Author: Aleksandrov O.   Afonin N.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7842

Source: Technical Physics, Vol.48, Iss.5, 2003-05, pp. : 580-586

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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