X-ray spectroscopic examination of thin HfO2 films ALD- and MOCVD-grown on the Si(100) surface

Author： Sokolov A.   Ovchinnikov A.   Lysenkov K.   Marchenko D.   Filatova E.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.55, Iss.7, 2010-07, pp. : 1045-1050

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