Theoretical description of high-temperature implantation of silicon carbide with N+ and Al+ ions

Author: Kulikov D.   Trushin Yu.   Yankov R.   Pezoldt J.   Skorupa W.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7850

Source: Technical Physics Letters, Vol.24, Iss.1, 1998-01, pp. : 17-19

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