Modified method of plasma-enhanced chemical vapor deposition of nanocrystalline silicon

Author： Golubev V.   Medvedev A.   Pevtsov A.   Feoktistov N.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.24, Iss.10, 1998-10, pp. : 758-759

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