Nanocrystalline silicon films obtained by plasma enhanced chemical vapor deposition under time-modulated-microwave-power discharge conditions

Author： Pevtsov A.   Feoktistov N.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.28, Iss.4, 2002-04, pp. : 305-307

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