Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy technology

Author： Bessolov V. Zhilyaev Yu. Konenkova E. Sorokin L. Feoktistov N. Sharofidinov Sh. Shcheglov M. Kukushkin S. Mets L. Osipov A.

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.36, Iss.6, 2010-06, pp. : 496-499

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