Estimation of activation energy and surface reaction mechanism of chlorine neutral beam etching of GaAs for nanostructure fabrication

Author： Thomas C   Tamura Y   Okada T   Higo A   Samukawa S  

Publisher： IOP Publishing

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.47, Iss.27, 2014-07, pp. : 275201-275207

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