Measurements of CD and sidewall profile of EUV photomask structures using CD-AFM and tilting-AFM

Author： Hahm Kai   Scholze Frank   Henn Mark-Alexander   Gross Hermann   Fluegge Jens   Bosse Harald   Dai Gaoliang  

Publisher： IOP Publishing

ISSN： 0957-0233

Source： Measurement Science and Technology, Vol.25, Iss.4, 2014-04, pp. : 44002-44014

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