Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

Author： Kulshreshtha Prashant K   Maruyama Ken   Kiani Sara   Blackwell James   Olynick Deirdre L   Ashby Paul D  

Publisher： IOP Publishing

ISSN： 0957-4484

Source： Nanotechnology, Vol.25, Iss.31, 2014-08, pp. : 315301-315309

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