Distribution and properties of oxide precipitates in annealed nitrogen doped 300 mm Si wafers

Author： Akhmetov V. D.   Richter H.   Seifert W.   Lysytskiy O.   Wahlich R.   Müller T.   Reiche M.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|27|1-3|159-161

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.27, Iss.1-3, 2010-03, pp. : 159-161

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