Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

Author: Nishiyama H.   Shigeta M.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|18|2|125-133

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.18, Iss.2, 2010-03, pp. : 125-133

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Abstract