Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes

Author: Bousquet A.   Goullet A.   Leteinturier C.   Coulon N.   Granier A.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|42|1|3-8

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.42, Iss.1, 2008-03, pp. : 3-8

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