Treatment of flat and hollow substrates by a pure nitrogen flowing post discharge

Author： Villeger S.   Sarrette J. P.   Rouffet B.   Cousty S.   Ricard A.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|42|1|25-32

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.42, Iss.1, 2007-12, pp. : 25-32

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Titration of N and C atoms in flowing N2-CH4 post-discharge between 300 K and 850 K

By Jaoul C.   Czerwiec T.   Belmonte T.   Ricard A.   Michel H.  

EPJ Applied Physics (The), Vol. 26, Iss. 3, 2004-05 ,pp. : 227-234

Edp Sciences

Access to resources Recommend Favorite

Strategies for Meeting the Proposed Discharge Limit for Ammonia Nitrogen at Advanced Wastewater Treatment Plants

By Kang S. Joh.   Olmstead K. P.  

Proceedings of the Water Environment Federation, Vol. 2012, Iss. 7, 2012-01 ,pp. : 7307-7325

Water Environment Federation

Access to resources Recommend Favorite

Polystyrene thin films treatment under DC point-to-plane low-pressure discharge in nitrogen for improving wettability

By Svarnas P.   Spyrou N.   Held B.  

EPJ Applied Physics (The), Vol. 28, Iss. 1, 2004-06 ,pp. : 105-112

Edp Sciences

Access to resources Recommend Favorite

Polystyrene thin films treatment under DC pulsed discharge in nitrogen: effect of sample placement and glow duration on the wettability

By Larrieu J.   Held B.   Soulem N.   Spyrou N.  

EPJ Applied Physics (The), Vol. 29, Iss. 2, 2004-11 ,pp. : 181-188

Edp Sciences

Access to resources Recommend Favorite

Dissociation of N2 in flowing glow discharge: Influence of H2*

By de Souza A. R.   Digiacomo M.   Muzart J. L. R.   Nahorny J.   Ricard A.  

EPJ Applied Physics (The), Vol. 5, Iss. 2, 2010-03 ,pp. : 185-189

Edp Sciences

Access to resources Recommend Favorite