p-type doping by platinum diffusion in low phosphorus doped silicon

Author： Ventura L.   Pichaud B.   Vervisch W.   Lanois F.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|23|1|33-37

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.23, Iss.1, 2002-11, pp. : 33-37

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