Control and monitoring of optical thin films deposition in a Matrix Distributed Electron Cyclotron Resonance reactor*

Author： Daineka D.   Kouznetsov D.   Bulkin P.   Girard G.   Bourée J.-E.   Drévillon B.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|28|3|343-346

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.28, Iss.3, 2004-11, pp. : 343-346

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Properties study of silicon carbide thin films prepared by electron cyclotron resonance plasma technology

By Valovič A.   Huran J.   Kučera M.   Kobzev A.P.   Gaži Š.  

EPJ Applied Physics (The), Vol. 56, Iss. 2, 2011-10 ,pp. : 24013-24013

Edp Sciences

Access to resources Recommend Favorite

High density plasma enhanced chemical vapor deposition of optical thin films

By Daineka D.   Bulkin P.   Girard G.   Bourée J.-E.   Drévillon B.  

EPJ Applied Physics (The), Vol. 26, Iss. 1, 2004-03 ,pp. : 3-9

Edp Sciences

Access to resources Recommend Favorite

Conceptual design studies of the Electron Cyclotron launcher for DEMO reactor

By Moro Alessandro  

EPJ Web of Conference, Vol. 157, Iss. issue, 2017-10 ,pp. : 03036-03036

Edp Sciences

Access to resources Recommend Favorite

Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications

By  

E3S Web of conferences, Vol. 22, Iss. issue, 2017-11 ,pp. : 00090-00090

Edp Sciences

Access to resources Recommend Favorite

Electron cyclotron resonance ion sources – physics, technology and future challenges

By Tarvainen O.  

EPJ Web of Conference, Vol. 149, Iss. issue, 2017-08 ,pp. : 01003-01003

Edp Sciences

Access to resources Recommend Favorite