Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics

Author： Novikova T.   De Martino A.   Ossikovski R.   Drévillon B.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|31|1|63-69

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.31, Iss.1, 2005-04, pp. : 63-69

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