Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablationof titanium in low-pressure CH4 and C2H2 atmospheres

Author： D'Anna E.   Fernández M.   Leggieri G.   Luches A.   Zocco A.   Majni G.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|28|2|159-163

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.28, Iss.2, 2004-08, pp. : 159-163

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Two-dimensional modelling of CH4-H2 radio-frequency discharges for a-C:H deposition

By Leroy O.   Videlot H.   Jolly J.  

EPJ Applied Physics (The), Vol. 16, Iss. 2, 2010-03 ,pp. : 121-130

Edp Sciences

Access to resources Recommend Favorite

A study of growth mechanism of microcrystalline thin silicon films deposited at low temperature by SiF4-H2-He PECVD

By Losurdo M.   Giangregorio M.   Grimaldi A.   Capezzuto P.   Bruno G.  

EPJ Applied Physics (The), Vol. 26, Iss. 3, 2004-05 ,pp. : 187-192

Edp Sciences

Access to resources Recommend Favorite

Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2 townsend dielectric barrier discharge

By Sarra-Bournet C.   Gherardi N.   Turgeon S.   Laroche G.   Massines F.  

EPJ Applied Physics (The), Vol. 47, Iss. 2, 2009-04 ,pp. : 22820-22820

Edp Sciences

Access to resources Recommend Favorite

Cytotoxic Effects of Polystyrene–Titanium–Arsenate Composite in Cultured H9c2 Cardiomyoblasts

By Mohammad Faruq   Arfin Tanvir  

Bulletin of Environmental Contamination and Toxicology, Vol. 91, Iss. 6, 2013-12 ,pp. : 689-696

Springer Publishing Company

Access to resources Recommend Favorite

Modeling the flow of activated H2 + CH4 mixture by deposition of diamond nanostructures

By Plotnikov Mikhail  

MATEC Web of conference, Vol. 115, Iss. issue, 2017-07 ,pp. : 07003-07003

Edp Sciences

Access to resources Recommend Favorite