Atom lithography with two-dimensional optical masks

Author： Petra S.J.H.   van Leeuwen K.A.H.   Feenstra L.   Hogervorst W.   Vassen W.  

Publisher： Springer Publishing Company

ISSN： 0946-2171

Source： Applied Physics B, Vol.79, Iss.3, 2004-08, pp. : 279-283

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