Improved electrical properties of HfTiO/GeO x N y gate dielectric Ge MOS capacitors by using wet–NO Ge-surface pretreatment

Author: Xu J.   Zou X.   Li C.   Lai P.   Chan C.  

Publisher: Springer Publishing Company

ISSN: 0947-8396

Source: Applied Physics A, Vol.94, Iss.2, 2009-02, pp. : 419-422

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