Base‐amplifying silicone resins with photobase‐generating side chains and their application to negative‐working photoresists

Publisher: John Wiley & Sons Inc

E-ISSN: 1099-0518|53|10|1205-1212

ISSN: 0887-624x

Source: Journal of Polymer Science Part A: Polymer Chemistry, Vol.53, Iss.10, 2015-05, pp. : 1205-1212

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract