

Publisher: Trans Tech Publications
E-ISSN: 1662-8985|2015|806|490-493
ISSN: 1022-6680
Source: Advanced Materials Research, Vol.2015, Iss.806, 2015-12, pp. : 490-493
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Shear-thickening polishing (STP) technology was used on ultraprecision machining of Si3N4 ceramics. The STP slurry with diamond abrasives was prepared for STP process and its rheological property was studied. The polishing performance of Si3N4 ceramics with STP was analyzed. Results show that STP slurry with diamond abrasives exhibits non-Newtonian power-law fluid characteristics with shear-thickening effect. As using STP slurry with abrasive particle size of 0.2 μm, the material removal rate changed from 4.22 to 4.05 μm/h after 60 mins ́ polishing; and decreased from 3.88 to 3.75 μm/h after 120 mins ́ polishing. The average surface roughness reduced from Ra 107.2 to Ra 6.5 nm after 120 mins ́ polishing.
Related content


Enhanced Absorption of Single Silicon Nanowire with Si3N4 Shell for Photovoltaic Applications
Advanced Materials Research, Vol. 2015, Iss. 1090, 2015-03 ,pp. :


High Thermal Stability of Mo/Si3N4/Mo/Si3N4/SiO2 Multilayer Solar Selective Coatings
Advanced Materials Research, Vol. 2015, Iss. 1102, 2015-06 ,pp. :




Optical and Electrochemical Properties of Co3O4/SiO2 Nanocomposite
Advanced Materials Research, Vol. 2016, Iss. 1133, 2016-02 ,pp. :