Characterisation of TiN and TiAlN thin films deposited on ground surfaces using focused ion beam milling

By Cairney J. M.   Harris S. G.   Ma L. W.   Munroe P. R.   Doyle E. D.  

Journal of Materials Science, Vol. 39, Iss. 11, 2004-06 ,pp. : 3569-3575

Springer Publishing Company

Access to resources Recommend Favorite

Optical, structural and electrical characteristics of aluminum oxynitride thin films deposited in an Ar-N gas mixture RF-sputtering system

By Araiza J.   Aguilar-Frutis M.   Falcony C.   Jergel Ma.  

Journal of Materials Science: Materials in Electronics, Vol. 16, Iss. 10, 2005-10 ,pp. : 657-661

Springer Publishing Company

Access to resources Recommend Favorite

The adhesion of copper films deposited onto aluminum nitride

By Park J.-W.   Pedraza A.   Lowndes D.  

Journal of Materials Science, Vol. 34, Iss. 8, 1999-04 ,pp. : 1933-1942

Springer Publishing Company

Access to resources Recommend Favorite

Structural, morphological, and mechanical properties of amorphous carbon and carbon nitride thin films deposited by reactive and ion beam assisted laser ablation

By Bae J-H.   Cho J.  

Journal of Materials Science, Vol. 34, Iss. 5, 1999-03 ,pp. : 1093-1098

Springer Publishing Company

Access to resources Recommend Favorite

Hardness of electron beam deposited titanium carbide films on titanium substrate

By Ferro D.   Scandurra R.   Latini A.   Rau J. V.   Barinov S. M.  

Journal of Materials Science, Vol. 39, Iss. 1, 2004-01 ,pp. : 329-330

Springer Publishing Company

Access to resources Recommend Favorite