The Effects of O₂:N₂ Gas Ratios on Structural, Optical, Electrical Properties of TiO_xN_y Thin Film Deposited by Reactive DC Magnetron Sputtering

Publisher： Trans Tech Publications

E-ISSN： 1662-9795|2015|659|540-544

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2015, Iss.659, 2015-09, pp. : 540-544

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