The Influence of N₂ Partial Pressure on Color, Mechanical, and Corrosion Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering

Publisher： Trans Tech Publications

E-ISSN： 1662-9795|2015|659|550-554

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2015, Iss.659, 2015-09, pp. : 550-554

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

The Effects of O₂:N₂ Gas Ratios on Structural, Optical, Electrical Properties of TiO_xN_y Thin Film Deposited by Reactive DC Magnetron Sputtering

Key Engineering Materials, Vol. 2015, Iss. 659, 2015-09 ,pp. : 540-544

Trans Tech Publications

Access to resources Recommend Favorite

Influence of Process Parameters on the Properties of TiO₂ Films Deposited by a D.C. Magnetron Sputtering System on Glass Support

Key Engineering Materials, Vol. 2015, Iss. 660, 2015-09 ,pp. : 86-92

Trans Tech Publications

Access to resources Recommend Favorite

Changes in Structural, Morphological, and Corrosion Properties of CrN Thin Film Effected by Varying N₂ Pressure in the Sputtering Process

Key Engineering Materials, Vol. 2015, Iss. 659, 2015-09 ,pp. : 555-559

Trans Tech Publications

Access to resources Recommend Favorite

Positron Annihilation in TaN Thin Sputtering Films Prepared with Various N₂ Partial Pressures

Defect and Diffusion Forum, Vol. 2017, Iss. 373, 2017-04 ,pp. : 237-240

Trans Tech Publications

Access to resources Recommend Favorite

Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 181-184

Trans Tech Publications

Access to resources Recommend Favorite