Structure and Photoelectric Properties of Cu₃N Thin Films by Reactive Magnetron Sputtering

E-ISSN： 1662-9752|2015|814|620-624

ISSN： 0255-5476

Source： Materials Science Forum, Vol.2015, Iss.814, 2015-04, pp. : 620-624

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Influence of Sputtering Power on the Structure, Optical and Electric Properties of Cu₃N Films

Materials Science Forum, Vol. 2015, Iss. 814, 2015-04 ,pp. : 596-600

Trans Tech Publications

Access to resources Recommend Favorite

Structure Stability and Mechanical Property of Y₂O₃ Thin Films Deposited by Reactive Magnetron Sputtering

Materials Science Forum, Vol. 2017, Iss. 898, 2017-07 ,pp. : 1516-1523

Trans Tech Publications

Access to resources Recommend Favorite

Microstructural and Mechanical Properties of TiAlN and Ti₃AlN Films Deposited by Reactive Magnetron Sputtering

Materials Science Forum, Vol. 2015, Iss. 816, 2015-05 ,pp. : 283-288

Trans Tech Publications

Access to resources Recommend Favorite

Effect of Nitrogen Content on Mechanical and Tribological Properties of HfC_xN_y Films Deposited by Reactive Magnetron Sputtering

Materials Science Forum, Vol. 2015, Iss. 817, 2015-05 ,pp. : 143-149

Trans Tech Publications

Access to resources Recommend Favorite

Study of Structural and Optical Properties of Cu₂ZnSnS₄ and Cu₂ZnGeS₄ Thin Films Synthesized by Sulfurization of Stacked Metallic Layers

Materials Science Forum, Vol. 2015, Iss. 814, 2015-04 ,pp. : 44-48

Trans Tech Publications

Access to resources Recommend Favorite