Focused Electron Beam Induced Deposition of 1,1-dichloro-1-silacyclohexane, silacyclohexane and 1,3,5-trisilacyclohexane; preliminary study on the role of low energy secondary electrons in the deposition process

Publisher： IOP Publishing

E-ISSN： 1742-6596|635|7|80-80

ISSN： 1742-6596

Source： Journal of Physics: Conference Series , Vol.635, Iss.7, 2015-09, pp. : 80-80

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