Characterization of Cavitation in a Single Wafer or Photomask Cleaning Tool

Publisher: Trans Tech Publications

E-ISSN: 1662-9779|2016|255|207-212

ISSN: 1012-0394

Source: Solid State Phenomena, Vol.2016, Iss.255, 2016-10, pp. : 207-212

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Abstract

A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by the presence of cavitation, a thorough acoustic analysis was performed on the device, by using a calibrated hydrophone scanned at the photomask location, and a quartz photomask with embedded sensors.