Publisher: Trans Tech Publications
E-ISSN: 1662-9752|2016|870|20-25
ISSN: 0255-5476
Source: Materials Science Forum, Vol.2016, Iss.870, 2016-10, pp. : 20-25
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Using IR laser radiation for backside etching of fused silica
By Zimmer K. Böhme R. Rauschenbach B.
Applied Physics A, Vol. 86, Iss. 3, 2007-03 ,pp. :
Laser etching of fused silica using an adsorbed toluene layer
By Zimmer K. Böhme R. Rauschenbach B.
Applied Physics A, Vol. 79, Iss. 8, 2004-12 ,pp. :
Relaxation of Thermal Residual Stress in Laser Irradiated Fused Silica by Annealing Process
Materials Science Forum, Vol. 2016, Iss. 874, 2016-11 ,pp. :