Structural analysis of hydrogenated nanocrystalline silicon thin films as a function of substrate temperature during deposition

Author： Anutgan Mustafa Uysal Sema Anutgan Tamila

Publisher： Edp Sciences

E-ISSN： 1286-0050|65|2|20301-20301

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.65, Iss.2, 2014-02, pp. : 20301-20301

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering

By Ben Othman A. Leconte Y. Marie P. Zellama K. Goncalves C. Portier X. Daouahi M. Bouchriha H. Rizk R.

EPJ Applied Physics (The), Vol. 29, Iss. 1, 2004-12 ,pp. : 33-38

Edp Sciences

Access to resources Recommend Favorite

Substrate-plasma interaction during amorphous silicon thin films growth by sputtering technique

By Khelfaoui F. Aida M. S.

EPJ Applied Physics (The), Vol. 47, Iss. 3, 2009-06 ,pp. : 31001-31001

Edp Sciences

Access to resources Recommend Favorite

Effect of the substrate on the structural and electrical propertiesof dc sputtered Ni thin films

By Ghebouli B. Layadi A. Kerkache L.

EPJ Applied Physics (The), Vol. 3, Iss. 1, 2010-03 ,pp. : 35-39

Edp Sciences

Access to resources Recommend Favorite

Substrate temperature dependence on the optical properties of Cu and Ag thin films

By Savaloni H. Khakpour Ahmad Reza

EPJ Applied Physics (The), Vol. 31, Iss. 2, 2005-08 ,pp. : 101-112

Edp Sciences

Access to resources Recommend Favorite

Pulsed excimer laser deposition of Permalloy thin films: structural and electrical properties

By Guittoum A. Layadi A. Kerdja T. Lafane S. Bouterfaia S.

EPJ Applied Physics (The), Vol. 42, Iss. 3, 2008-06 ,pp. : 235-239

Edp Sciences

Access to resources Recommend Favorite