Analytical calculation of site and surface reaction probabilities of SiHx radicals in PECVD process

Author: Babahani Oumelkheir   Khelfaoui Fethi   Tayeb Meftah Mohammed  

Publisher: Edp Sciences

E-ISSN: 1286-0050|62|1|10301-10301

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.62, Iss.1, 2013-03, pp. : 10301-10301

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