Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation

Author: Duarte D. A.   Massi M.   da Silva Sobrinho A.S.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|54|2|20801-20801

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.54, Iss.2, 2011-05, pp. : 20801-20801

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