Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2 townsend dielectric barrier discharge

Author： Sarra-Bournet C.   Gherardi N.   Turgeon S.   Laroche G.   Massines F.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|47|2|22820-22820

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.47, Iss.2, 2009-04, pp. : 22820-22820

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Calibration of a 2 dimensional hydrogenated amorphous silicon thin film position sensitive detector (2D a-Si:H TFPSD)

By Gnanvo K.   Wu Z. Y.  

EPJ Applied Physics (The), Vol. 24, Iss. 3, 2003-10 ,pp. : 231-239

Edp Sciences

Access to resources Recommend Favorite

Two-dimensional modelling of CH4-H2 radio-frequency discharges for a-C:H deposition

By Leroy O.   Videlot H.   Jolly J.  

EPJ Applied Physics (The), Vol. 16, Iss. 2, 2010-03 ,pp. : 121-130

Edp Sciences

Access to resources Recommend Favorite

Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablationof titanium in low-pressure CH4 and C2H2 atmospheres

By D'Anna E.   Fernández M.   Leggieri G.   Luches A.   Zocco A.   Majni G.  

EPJ Applied Physics (The), Vol. 28, Iss. 2, 2004-08 ,pp. : 159-163

Edp Sciences

Access to resources Recommend Favorite

Dissociation of N2 in flowing glow discharge: Influence of H2*

By de Souza A. R.   Digiacomo M.   Muzart J. L. R.   Nahorny J.   Ricard A.  

EPJ Applied Physics (The), Vol. 5, Iss. 2, 2010-03 ,pp. : 185-189

Edp Sciences

Access to resources Recommend Favorite

Numerical simulation of the growth of the γ’-iron nitride in NH3-H2-N2 gas mixture (570°C and 1 atm) (Part II)

By Rida M.   Tout H.  

Revue de Métallurgie, Vol. 107, Iss. 4, 2010-06 ,pp. : 125-129

Edp Sciences

Access to resources Recommend Favorite