XAFS Studies of TiSi2 and CoSi2 Thin Films at the Ti, Co and Si K-Edge

E-ISSN： 1764-7177|7|C2|C2-1135-C2-1136

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.7, Iss.C2, 1997-04, pp. : C2-1135-C2-1136

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