Monitoring of SiC Deposition in an Industrial CVI/CVD Reactor by In-Situ FTIR Spectroscopy

Publisher: Edp Sciences

E-ISSN: 1764-7177|05|C5|C5-97-C5-104

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-97-C5-104

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