REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS

Publisher： Edp Sciences

E-ISSN： 1764-7177|02|C2|C2-847-C2-847

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-847-C2-847

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Remote plasma chemical vapour deposition of silicon nitride films

By  

Journal de Physique III, Vol. 2, Iss. 8, 1992-08 ,pp. : 1421-1429

Edp Sciences

Access to resources Recommend Favorite

ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films

By  

Journal of Physics: Conference Series , Vol. 550, Iss. 1, 2014-11 ,pp. : 257-264

IOP Publishing

Access to resources Recommend Favorite

Chemical vapour deposition of nitride and oxynitride dielectric films

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-465-C3-465

Edp Sciences

Access to resources Recommend Favorite

Remote Microwave Plasma Enhanced Chemical Vapour Deposition of SiO2 Films : Oxygen Plasma Diagnostic

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-621-C5-628

Edp Sciences

Access to resources Recommend Favorite

Carbon nitride films prepared by inductively coupled plasma chemical vapour deposition from a solid carbon source

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-725-Pr8-732

Edp Sciences

Access to resources Recommend Favorite