A comparative study of O2/SiH4 and N2O/SiH4 mixtures for SiO2 deposition in a microwave afterglow

Publisher： Edp Sciences

E-ISSN： 1764-7177|03|C3|C3-241-C3-246

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.03, Iss.C3, 1993-08, pp. : C3-241-C3-246

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