Comparison of tantalum precursors for use in liquid injection CVD of thin film oxides, dielectrics and ferroelectrics

Publisher: Edp Sciences

E-ISSN: 1764-7177|09|PR8|Pr8-935-Pr8-942

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-935-Pr8-942

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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