Publisher： Edp Sciences
E-ISSN： 1764-7177|12|4|51-61
ISSN： 1155-4339
Source： Le Journal de Physique IV, Vol.12, Iss.4, 2002-06, pp. : 51-61
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Process characterization for LPCVD TEOS-ozone based SiO
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
Access to resources
Recommend
PROCESS CHARACTERISATION FOR LPCVD DEPOSITION OF SiO
Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. :
LPCVD SiO
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
Access to resources
CHARACTERIZATION OF SiO
Le Journal de Physique Colloques, Vol. 49, Iss. C4, 1988-09 ,pp. :