Crystallization of phosphorus-doped amorphous silicon films prepared by glow discharge decomposition of silane

Publisher： Edp Sciences

E-ISSN： 0035-1687|16|12|657-662

ISSN： 0035-1687

Source： Revue de Physique Appliquée (Paris), Vol.16, Iss.12, 1981-12, pp. : 657-662

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