STRUCTURAL AND ELECTRONIC PROPERTIES OF CVD SILICON FILMS NEAR THECRYSTALLIZATION TEMPERATURE

Publisher： Edp Sciences

E-ISSN： 0449-1947|43|C1|C1-271-C1-276

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.43, Iss.C1, 1982-10, pp. : C1-271-C1-276

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