PROPERTIES OF WSi2 : OHMIC CONTACT TO N+ AND P+ Si, BARRIER BETWEEN Al AND Si, AND FEASIBILITY AS FIRST METAL IN MULTILEVEL METALLIZATION PROCESSES

Publisher： Edp Sciences

E-ISSN： 0449-1947|49|C4|C4-171-C4-174

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.49, Iss.C4, 1988-09, pp. : C4-171-C4-174

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