THE EVALUATION OF β-Si3N4 MICROSTRUCTURES USING PLASMA-ETCHING AS A PREPARATIVE TECHNIQUE

Publisher： Edp Sciences

E-ISSN： 0449-1947|47|C1|C1-297-C1-301

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.47, Iss.C1, 1986-02, pp. : C1-297-C1-301

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