Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma

Author： Um Doo-Seung   Kim Dong-Pyo   Woo Jong-Chang   Kim Chang-Il  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.384, Iss.1, 2009-01, pp. : 17-24

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